Chapter 1: A New Scene

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Welcome!

Welcome to Equipping Yourself for Educational Success (E.Y.E.S.) at Seneca. We’re so glad to see you here!

This online resource is designed as a transition program to help you be more
prepared, informed and confident as you begin your postsecondary studies at Seneca Polytechnic. It is designed with all students in mind, no matter your background or who you are.

Postsecondary education features less student-teacher contact, supervision and personal support networks than many previous student experiences. However, the overall expectations and academic competition can be greater.

In this online resource, you will be introduced to multiple self-paced sections that cover topics like understanding your strengths and weaknesses, navigating postsecondary expectations, best practices for communicating with faculty, available academic and personal supports, suggestions on managing finances, keeping your health in mind and more.

Before we really get into the content of this online resource, we want to welcome everyone to this inclusive space. Everyone, regardless of background, where you come from, what language you speak, how you identify, or with whom you associate, is welcome.

We acknowledge that Seneca’s campuses are located on the Land stewarded by Anishinaabe, Haudenosaunee and Wendat Nations. We acknowledge Treaty 13 (Toronto Purchase) signed with the Mississaugas of the Credit First Nation and the Williams Treaty, signed with multiple Mississauga and Chippewa First Nations. We are all interconnected as treaty people with a shared obligation to learn, respect, honour and sustain.

Today, this land continues to be home for many diverse Indigenous people, including First Nations, Métis and Inuit. We are grateful for the continuous and unceasing Indigenous stewardship of these lands and waters.

 

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E.Y.E.S. at Seneca Copyright © 2024 by Michael Buzdon; Seneca Polytechnic Accessible Learning Services; and The Regional Assessment and Resource Centre (RARC) is licensed under a Creative Commons Attribution-NonCommercial-ShareAlike 4.0 International License, except where otherwise noted.

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